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Imec Shows Path to Line Resistance Halving Using Semi-Damascene with High-Aspect-Ratio Processing - imec presents options to reduce the metal line resistance at tight metal pitches, mitigating the resistance/capacitance (RC) increase of future interconnects using direct metal patterning - imec-int.com
Imec Shows Path to Line Resistance Halving Using Semi-Damascene with High-Aspect-Ratio Processing

 

NewswireToday - /newswire/ - Leuven, Belgium, 2022/06/30 - imec presents options to reduce the metal line resistance at tight metal pitches, mitigating the resistance/capacitance (RC) increase of future interconnects using direct metal patterning - imec-int.com.

   
 
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This week, at the 2022 IEEE International Interconnect Technology Conference (IITC 2022) (iitc-conference.org), imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, presents options to reduce the metal line resistance at tight metal pitches, mitigating the resistance/capacitance (RC) increase of future interconnects using direct metal patterning. For the first time, high aspect ratio (AR=6) processing of ruthenium (Ru) in a semi-damascene fashion is experimentally shown to result in about 40% resistance reduction without sacrificing area. Additional simulations confirm the benefits at circuit level in combination with airgaps as dielectrics. A complementary experimental study shows that the reliability of semi-damascene with airgaps is competitive when compared to dual-damascene with low-k dielectrics.

After providing the first experimental demonstration of a functional two-metal-level semi-damascene module at 18nm metal pitch, AR=3, with fully self-aligned vias at VLSI 2022, imec proposes to extend this integration scheme to further reduce the line resistance of the Ru interconnects, while keeping the same footprint. This can be achieved by high-AR processing of the Ru lines using an advanced subtractive metal etch process. Zsolt Tokei: “We measured a significant line resistance reduction of about 40% on Ru lines with AR=6 compared to lines with conventional AR=3. In addition, we showed the benefits at circuit level of implementing high-AR semi-damascene lines with airgaps.” In a benchmark study, imec also demonstrated that the semi-damascene flow with airgaps is reliable with more than 10 years lifetime.

“With no less than 10 oral presentations at this year’s IITC, addressing the main challenges in interconnect scaling, imec has a proven path to push the interconnect roadmap for the coming ten years,” concludes Zsolt Tokei. “The papers cover advances in semi-damascene integration as a promising interconnect scheme for future logic nodes, memory technologies and highlight progress in middle-of-line (MOL) metallization schemes, dielectrics, alternative metals exploration, and reliability.”

About imec

Imec (imec-int.com) is a world-leading research and innovation center in nanoelectronics and digital technologies. Imec leverages its state-of-the-art R&D infrastructure and its team of more than 5,000 employees and top researchers, for R&D in advanced semiconductor and system scaling, silicon photonics, artificial intelligence, beyond 5G communications and sensing technologies, and in application domains such as health and life sciences, mobility, industry 4.0, agrofood, smart cities, sustainable energy, education, … Imec unites world-industry leaders across the semiconductor value chain, Flanders-based and international tech, pharma, medical and ICT companies, start-ups, and academia and knowledge centers. Imec is headquartered in Leuven (Belgium), and has research sites across Belgium, in the Netherlands and the USA, and offices in China, India, Taiwan and Japan. In 2021, imec's revenue (P&L) totaled 732 million euro.

Imec is a registered trademark for the activities of imec International (IMEC International, a legal entity set up under Belgian law as a “stichting van openbaar nut”), imec Belgium (IMEC vzw supported by the Flemish Government), imec the Netherlands (Stichting IMEC Nederland), imec Taiwan (IMEC Taiwan Co.), imec China (IMEC Microelectronics (Shanghai) Co. Ltd.), imec India (IMEC India Private Limited), imec San Francisco (IMEC Inc.) and imec Florida (IMEC USA Nanoelectronics Design Center Inc.).

 
 
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Imec Shows Path to Line Resistance Halving Using Semi-Damascene with High-Aspect-Ratio Processing

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