NEWSWIRETODAY Press Release& Newswire Distribution | HOME
MOST TRUSTED NEWSWIRE PRESS RELEASE DISTRIBUTION
PRTODAY / NewswireToday press release distribution service network
Written by / Agency / Source: Imec
Check Ads Availability|e-mail Article

Are you the owner of this article?, Turn it PREMIUM with your LOGO instead - and make it 3rd party Ads-Free! within the next hour!

Imec Demonstrates 20nm Pitch Line/Space Resist Imaging with High-NA EUV Interference Lithography - The achievement marks a major milestone of imec and KMLabs’ AttoLab - KMLabs.com / Inpria.com / imec-int.com
Imec Demonstrates 20nm Pitch Line/Space Resist Imaging with High-NA EUV Interference Lithography

 

NewswireToday - /newswire/ - Leuven, Belgium, 2021/02/09 - The achievement marks a major milestone of imec and KMLabs’ AttoLab - KMLabs.com / Inpria.com / imec-int.com.

   
 
Your Banner Ad Here instead - Showing along with ALL Articles covering Electronics / Instrumentation / RFID Announcements

Replace these Affiliate Programs at ANYTIME! Your banner here within the next hour. Learn How!


 

Imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, reports for the first time the use of a 13.5 nm High Harmonic Generation source for the printing of 20nm pitch line/spaces using interference lithographic imaging of an Inpria metal-oxide resist under high-numerical-aperture (high-NA) conditions. The demonstrated high-NA capability of the EUV interference lithography using this EUV source presents an important milestone of the AttoLab, a research facility initiated by imec and KMLabs to accelerate the development of the high-NA patterning ecosystem on 300 mm wafers. The interference tool will be used to explore the fundamental dynamics of photoresist imaging and provide patterned 300 mm wafers for process development before the first 0.55 high-NA EXE5000 prototype from ASML becomes available.

The high-NA exposure at 13.5nm was emulated with a coherent high-flux laser source of KMLabs in a Lloyd’s-Mirror-based interference setup for coupon experiments on imec’s spectroscopy beamline. This apparatus supplies critical learning for the next step, expansion to 300 mm wafer interference exposures. In this arrangement, light reflected from a mirror interferes with light directly emitted by the 13.5nm laser source, generating a finely detailed interference pattern suited for resist imaging. The pitch of the imaged resist pattern can be tuned by changing the angle between the interfering light beams. With this setup, 20nm line/spaces could for the first time at imec be successfully patterned in an Inpria metal-oxide resist (exposure dose range of ~54-64mJ/cm2, interference angle 20°) using a single-exposure, coated on coupon samples.

“The high-flux laser source of KMLabs was used at a record small wavelength of 13.5nm, emitting a series of attosecond (10-18s) pulses that reaches the photoresist with a pulse duration that is a few femtoseconds (10-15s) in width. This imposed challenging requirements on the temporal coherence of the interfering waves,” explains John Petersen, Principal Scientist at imec and SPIE Fellow. “The demonstrated capability of this setup for emulating high-NA EUV lithography exposures is an important AttoLab milestone. It demonstrates that we can synchronize femtosecond wide pulses, that we have excellent vibration control, and excellent beam pointing stability. The 13.5nm femtosecond enveloped attosecond laser pulses allow us to study EUV photon absorption and ultrafast radiative processes that are subsequently induced in the photoresist material. For these studies, we will couple the beamline with spectroscopy techniques, such as time-resolved infrared and photoelectron spectroscopy, that we earlier installed within the laboratory facility. The fundamental learnings from this spectroscopy beamline will contribute to developing the lithographic materials required for the next-generation (i.e., 0.55 NA) EUV lithography scanners, before the first 0.55 EXE5000 proto-type becomes available.”

Next up, the learnings from this first proof of concept will now be transferred to a second, 300mm-wafer-compatible EUV interference lithography beamline that is currently under installation. This beamline is designed for screening various resist materials under high-NA conditions with a few seconds per single-exposure, and for supporting the development of optimized pattern, etch and metrology technologies viable for high-NA EUV lithography.“The lab’s capabilities are instrumental for fundamental investigations to accelerate material development toward high NA EUV,” said Andrew Grenville, CEO of Inpria. “We are looking forward to deeper collaboration with the AttoLab”.

“Our interference tools are designed to go from 32nm pitch to an unprecedented 8nm pitch on 300 mm wafers, as well as smaller coupons,” says John Petersen. “They will offer complementary insights in what is already gained from 0.33NA EUV lithography scanners which are currently being pushed to their ultimate single-exposure resolution limits. In addition to patterning, many other materials research areas will benefit from this state-of-the-art AttoLab research facility. For example, the ultrafast analytic capability will accelerate materials development of the next-generation logic, memory, and quantum devices, and of the next-generation metrology and inspection techniques.”

About imec

Imec (imec-int.com) is a world-leading research and innovation hub in nanoelectronics and digital technologies. The combination of our widely acclaimed leadership in microchip technology and profound software and ICT expertise is what makes us unique. By leveraging our world-class infrastructure and local and global ecosystem of partners across a multitude of industries, we create groundbreaking innovation in application domains such as healthcare, smart cities and mobility, logistics and manufacturing, energy and education.

As a trusted partner for companies, start-ups and universities we bring together more than 4,000 brilliant minds from almost 100 nationalities. Imec is headquartered in Leuven, Belgium and has distributed R&D groups at a number of Flemish universities, in the Netherlands, Taiwan, USA, and offices in China, India and Japan. In 2019, imec's revenue (P&L) totalled 640 million euro.

Imec is a registered trademark for the activities of IMEC International (a legal entity set up under Belgian law as a “stichting van openbaar nut”), imec Belgium (IMEC vzw supported by the Government of Flanders), imec the Netherlands (Stichting IMEC Nederland, part of Holst Centre and OnePlanet, supported by the Dutch Government), imec Taiwan (IMEC Taiwan Co.), imec China (IMEC Microelectronics (Shanghai) Co. Ltd.), imec India (Imec India Private Limited) and imec Florida (IMEC USA nanoelectronics design center).

About KMLabs

KMLabs (Boulder, Colorado, U.S.) (kmlabs.com) is a leading manufacturer of compact, high-performance, ultrafast advanced lasers and systems for research and industrial applications, including multi-photon imaging, spectroscopy, coherent soft X-ray and EUV femtosecond-to-attosecond pulse generation and applications in imaging and spectroscopy. It is the only commercial supplier of a coherent tabletop soft X-ray laser light source. The company’s femtosecond laser systems (Ti:sapphire and also fiber laser based) offer unprecedented power, stability, and control, opening-up new possibilities for fundamental research and industrial metrology, imaging, and materials characterization.

About Inpria

Inpria Corporation (inpria.com) designs photoresists to unlock the full potential of EUV lithography. Inpria’s metal oxide photoresists for EUV enable superior performance with simplified processing. By focusing on emerging requirements, Inpria has developed the only purpose-built solution to support EUV lithography at the 7nm process node and beyond.

 
 
Your Banner Ad Here instead - Showing along with ALL Articles covering Electronics / Instrumentation / RFID Announcements

Replace these Affiliate Programs at ANYTIME! Your banner here within the next hour. Learn How!


 

Written by / Agency / Source: Imec

 
 

Availability: All Regions (Including Int'l)

 

Traffic Booster: [/] Quick NewswireToday Visibility Checker

 

Distribution / Indexing: [+]  / [Company listed above is a registered member of our network. Content made possible by PRZOOM / PRTODAY indexing services]

 
 
# # #
 
 
  Your Banner Ad showing on ALL
Electronics / Instrumentation / RFID articles,
CATCH Visitors via Your Competitors Announcements!


Imec Demonstrates 20nm Pitch Line/Space Resist Imaging with High-NA EUV Interference Lithography

Company website links NOT available to basic submissions
It is OK to republish and/or LINK any newswire for any legitimate media purpose as long as you name NewswireToday and LINK as the source.
 
Publisher Contact: Jade Liu - imec.be 
+32 16 28 16 93 jade.liu[.]imec.be
 
Newswire Today - PRZOOM / PRTODAY disclaims any content contained in this article. If you need/wish to contact the company who published the current release, you will need to contact them - NOT us. Issuers of articles are solely responsible for the accuracy of their content. Our complete disclaimer appears here.
IMPORTANT INFORMATION: Issuance, publication or distribution of this press release in certain jurisdictions could be subject to restrictions. The recipient of this press release is responsible for using this press release and the information herein in accordance with the applicable rules and regulations in the particular jurisdiction. This press release does not constitute an offer or an offering to acquire or subscribe for any Imec securities in any jurisdiction including any other companies listed or named in this release.

Electronics / Instrumentation / RFID via RSSAdd NewswireToday - PRZOOM Headline News to FeedBurner
Find who RetweetFollow @NewswireTODAY

Are you the owner of this article?, Turn it PREMIUM with your LOGO instead - and make it 3rd party Ads-Free! within the next hour!


Read Latest Articles From Imec / Company Profile


Read Electronics / Instrumentation / RFID Most Recent Related Newswires:

SkyRFID Move to U.S.A. Complete for 2022 - Announces New USA Incorporated Firm, SkyRFID, LLC
Bruker Expands Proteomics Strategy with PreOmics
Bruker Acquires Prolab Instruments to Augment Multiomics Solutions
Curtiss-Wright Honored for Sustained Excellence by Northrop Grumman Aeronautics Systems (NGAS) Delegation Program
Curtiss-Wright Updates TDL Software Products in Advance of DoD’s Link 16 Cryptographic Modernization Capability Mandate
Kontron Announces Products Featuring the Latest 12th Gen Intel® Core™ Processors
Subsidiaries SpectraSensors and Kaiser Optical Systems Merge into Endress+Hauser Optical Analysis
Infineon’s New Generation of AURIX™ Microcontrollers Accelerates Electrification and Digitalization of the Car
Infineon Announces Start of Production of New CO2 Sensors, Providing Innovative Solution for the Growing Demand for Accurate Indoor Air Quality
Leonardo Completes the Acquisition of 25.1% in HENSOLDT
Yokogawa Commences Research Project with JAXA Space Exploration Innovation Hub Center
The Vivo S12 Pro to be the First Smartphone to Feature Xensation®
MICLEDI Announces 300mm MicroLED Production Breakthrough Poised to Set the High-Water Mark for Augmented Reality Glasses
Sensory Analytics Awarded for Technology Innovation by Frost & Sullivan for Improving Coating Quality with Ruggedized Optical Interference Technology
TactoTek Oy Applauded by Frost & Sullivan for Improving Industrial Resource Usage and Reducing Energy Use

Boost Your Social Network
& Crowdfunding Campaigns


LIFETIME SOCIAL MEDIA WALL
NewswireToday Celebrates 10 Years in Business


PREMIUM Members


Visit  BizJobs.com

Visit SkyRFID, LLC





 
  ©2022 NewswireToday — Limelon Advertising, Co.
Home | About | Advertise/Pricing | Contact | Investors | Privacy/TOS | Sitemap | FRANCAIS
newswire, PR press releases distribution service magazines engine news alert newsroom press room breaking news public relations articles company news alerts newswiredistribution ezine bizentrepreneur biznewstoday digital business report market search pr firms agencies reports distri-bution today investor relation successful internet entrepreneurs newswire distribution prtoday.com newswiredistribution asianewstoday bizwiretoday USA pr UK today - NOT affiliated with PRNewswire as we declined their partnership offer in 2013
 
PRTODAY & NewswireTODAY are proudly NOT affiliated with USA TODAY (usatoday.com)