NewswireToday - /newswire/ -
Manassas, VA, United States, 2011/06/03 - Together with Aqueous Technologies and Henkel, ZESTRON, will host an extensive, free-of-charge one day workshop at Henkel Electronic Materials in Irvine, California, on June 14th, 2011, from 8:30 am to 4:00 pm.
Together with Aqueous Technologies and Henkel, ZESTRON, the worldwide leading provider of cleaning process solutions, services and training for the electronics manufacturing industry, will host an extensive, free-of-charge one day workshop at Henkel Electronic Materials in Irvine, California, on June 14th, 2011, from 8:30 am to 4:00 pm.
This comprehensive training provides in-depth information on the key elements for a successful PCB cleaning process as well as hands-on demonstrations. ZESTRON discusses the topics of “Why Clean PCB’s?” as well as the analytical test techniques available in the market to ensure a stable process and the highest level of cleanliness. Furthermore, ZESTRON provides insight to how manufacturers can comply with the environmental regulations in California.
Aqueous Technologies addresses the topics of conductive crystals, electrical leakage, and white residues as well as the rush to clean No-Clean. AQT also presents an in-depth look at defluxing equipment along with information on best practices and a roadmap to installing a successful process.
Additionally, Henkel’s presentation provides detailed information on modern solder paste residues and adhesive interactions and includes the topics of underfill, circuit board protection and chemical compatibility.
For more information or to participate in this free-of-charge event, please contact Sal Sparacino at s.sparacino[.]zestronusa.com.
Headquartered in Manassas, Virginia and operating in over 35 countries, ZESTRON (zestron.com) is the leading global provider of precision cleaning products and services. With the largest team of chemical engineers in the industry, ZESTRON leverages comprehensive capabilities to ensure customers surpass even the most stringent cleaning and vapor recovery requirements.