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Samsung and Mentor Graphics Expand Calibre Signoff and Foundry Mask Processing Solution for 20nm - Mentor Graphics Corp. announced that Mentor and Samsung Electronics have expanded their 20nm collaboration announced in March to include Calibre® signoff design kits for 20nm (NASDAQ: MENT) - Mentor.com
Samsung and Mentor Graphics Expand Calibre Signoff and Foundry Mask Processing Solution for 20nm

 

NewswireToday - /newswire/ - Wilsonville, OR, United States, 2012/06/06 - Mentor Graphics Corp. announced that Mentor and Samsung Electronics have expanded their 20nm collaboration announced in March to include Calibre® signoff design kits for 20nm (NASDAQ: MENT) - Mentor.com. NASDAQ: MENT

   
 
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Mentor Graphics Corporation (NASDAQ: MENT) today announced that Mentor and Samsung Electronics have expanded their 20nm collaboration announced in March to include Calibre® signoff design kits for 20nm, including multiple approaches to double patterning (DP) and advanced fill capabilities. Samsung has also signed an agreement last November to expand its use of the Calibre platform for computational lithography, including advanced optical proximity correction and verification, and mask process correction. All these efforts are to support increased production capacity for Samsung’s rapidly growing foundry business.

The collaborative design kit solution supports all International Semiconductor Development Alliance (ISDA) DP design flows with design rule, layout versus schematic (LVS) checking, and parasitic extraction enhanced to meet the challenging requirements of 20nm designs. It also includes advanced capabilities for design-manufacturing co-optimization including intelligent multi-layer fill techniques, fast litho hotspot detection, and process friendly design support.

“The Mentor Calibre platform is Samsung Foundry’s signoff and manufacturing choice for a number of reasons,” said Dr. Kee Sup Kim, vice president of System LSI Design Technology team, Device Solutions, Samsung Electronics. “Calibre continues to provide the most advanced physical verification, design for manufacturing (DFM), and mask processing technology in support of Samsung’s advanced process nodes. The tight linkage between Calibre tools provides a co-optimized flow between design and manufacturing to accelerate time to market. For example, using Calibre for both the manufacturing and design verification of double patterning allows Samsung to provide our customers with greater options to address their specific design style. Great performance, trusted results and openness are all important for a solution that works regardless of the customer’s design cockpit, the size of their designs, or their preferred approach to double patterning.”

Mentor partnered with Samsung to develop production-ready foundry kits for 28nm, which enable physical verification, litho checking, critical area analysis, critical feature analysis, and dummy fill solutions. For the 20nm process, test chips coming from internal Samsung design teams and third-party IP providers have been taped out using a comprehensive Mentor® flow including multi-patterning and advanced design-for-manufacturing (DFM) checks. The Calibre platform supports all DP styles including colorless, auto two color, mixed two color and manual two color. The platform also provides advanced features such as automated decomposition and patented real-time graphical “error rings” for coloring conflict resolution, which reduces time consuming iterations when fixing DP violations.

“The increasing challenges of 20nm make it imperative to have a close working relationship among all elements of the foundry ecosystem,” said Joseph Sawicki, vice president and general manager of the Design-to-Silicon division of Mentor Graphics. “Our strong partnership with Samsung continues to 20nm and beyond as we work to deliver the technology, performance, and capacity for all parts of the design and tape out flow so that mutual customers can readily access Samsung’s foundry offerings.”

To learn more about what Samsung and Mentor are providing to mutual customers, please visit either company’s booth at this year’s Design Automation Conference, June 4-6 in San Francisco, CA. For additional details, please go to Mentor’s DAC web page at mentor.com/go/dac-2012.

About Mentor Graphics
Mentor Graphics Corporation (mentor.com) is a world leader in electronic hardware and software design solutions, providing products, consulting services and award-winning support for the world’s most successful electronic, semiconductor and systems companies. Established in 1981, the company reported revenues in the last fiscal year of about $1,015 million. Corporate headquarters are located at 8005 S.W. Boeckman Road, Wilsonville, Oregon 97070-7777.

(Mentor Graphics, Mentor and Calibre are registered trademarks of Mentor Graphics Corporation. All other company or product names are the registered trademarks or trademarks of their respective owners).

 
 
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Written by / Agency / Source: Mentor Graphics Corporation

 
 

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Samsung and Mentor Graphics Expand Calibre Signoff and Foundry Mask Processing Solution for 20nm

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Publisher Contact: Gene Forte / Sonia Harrison - Mentor.com 
503-685-1193 / 503-685-1165 gene_forte[.]mentor.com / sonia_harrison[.]mentor.com
 
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